Search Results - coumba ndoye

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Multiple Exposure Patterning in a Single Photoresist Layer
VT researchers have developed a photolithography technique that cuts the cost of double patterning in half, simplifies single exposure photolithography, and significantly reduces diffraction distortion of complex patterns. This approach also supports higher processing throughput and greater fidelity of the smallest features. The result is the poten...
Published: 9/5/2012   |   Inventor(s): Coumba Ndoye, Marius Orlowski
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Category(s): Optics
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